s i l i c o n
(properties)
|
state |
material |
data |
range (micron) |
reference (and link) |
. |
silicon |
n,k [tab] |
0.6 - 2.3 |
Ingersoll (1910) Astrophys. J. 32, 265. |
cryst. |
silicon |
n |
1 - 2.6 |
Briggs (1950) Phys. Rev. 77, 287 |
. |
silicon |
. |
infrared |
Simon (1951) JOSA 41, 730 |
cryst. |
silicon |
abs.c.(T) [fig] |
14.3 - 50 |
Collins, Fan (1954) Phys. Rev. 93, 674 |
cryst. |
silicon |
abs. (T) |
. |
Dash, Newman (1955) Phys. Rev. 99, 1151 |
cryst. |
silicon |
n |
1.4 - 11 |
Salzberg, Villa (1957) J. Opt. Soc. Am. 47, 244 |
. |
silicon |
abs. |
1 - 12 |
Spitzer, Fan (1957) Phys. Rev. 108, 268 |
. |
silicon |
abs. |
. |
Macfarlane et al. (1958) Phys. Rev. 111, 1245 |
cryst. |
silicon |
n |
infrared |
Cardona et al. (1959) J. Phys. Chem. Sol. 8, 204 |
cryst. |
silicon |
abs.c. |
6.7 - 25 |
Johnson (1959) Proc. Phys. Soc. Lond. 73, 265 |
. |
silicon |
abs. (T) |
0.95 - 1.27 eV |
Macfarlane et al. (1959) J. Phys. Chem. Solids 8, 388 |
cryst. |
silicon |
n,k [fig] |
0.11 - 1.2 |
Philipp, Taft (1960) Phys. Rev. 120, 37 |
cryst. |
silicon |
n,k |
70 - 600 |
Sasaki, Ishiguro (1962) Phys. Rev. 127, 1091 |
. |
silicon |
e |
infrared |
Philipp, Ehrenreich (1963) Phys. Rev. 129, 1550 |
. |
silicon |
abs. |
2 - 10 |
Hara, Nishi (1966) J. Phys. Soc. Jpn. 21, 1222 |
. |
silicon |
abs. (T) |
infrared |
Runyan (1966) Technology Semiconductor Silicon, McGraw-Hill |
cryst. |
silicon |
n,k |
70 - 600 |
Randall, Rawcliffe (1967) Appl. Opt. 6, 1889 |
. |
silicon |
abs. |
1 - 1.5 eV |
Vol'fson, Subashiev (1967) Sov. Phys. Semicond. 1, 327 |
amor. |
silicon |
k (T) [fig] |
0.77 - 2.48 |
Brodsky et al. (1970) Phys. Rev. B1, 2632. |
cryst. |
silicon |
n |
1.12 - 2.16 |
Primak (1971) Appl. Opt. 10, 759 |
cryst. |
silicon |
abs. [fig] |
0.0118 - 0.0125 |
Brown, Rustgi (1972) Phys. Rev. Let. 28, 497. |
amor. |
silicon |
abs. [fig] |
0.0118 - 0.0125 |
Brown, Rustgi (1972) Phys. Rev. Let. 28, 497. |
amor. |
silicon |
n,k; e1,2 [fig] |
0.06 - inf-ty |
Pierce, Spicer (1972) Phys. Rev. B 5, 3017. |
cryst. |
silicon |
n,k |
0.05 - 0.25 |
Philipp (1972) J. Appl. Phys. 43, 2836 |
. |
silicon |
. |
0.3655(?) |
So, Vedam (1972) JOSA 62, 16 |
. |
silicon |
. |
0.5461 |
So, Vedam (1972) JOSA 62, 596 |
cryst. |
silicon |
n |
1.3 - 10 |
Villa (1972) Appl. Opt. 11, 2102 |
cryst. |
silicon |
n,k (T) [tab] |
30 - 333 |
Loewenstein et al. (1973) Appl. Opt. 12, 398. |
amor. |
silicon |
abs. [fig] |
14.3 - 286 |
Brodsky, Lurio (1974) Phys. Rev. B 9, 1646. |
alpha |
silicon |
abs. [fig] |
14.3 - 286 |
Brodsky, Lurio (1974) Phys. Rev. B 9, 1646. |
cryst. |
silicon |
k; e2 |
. |
Hulthen (1975) Phys. Scr. 12, 342 |
. |
silicon |
refl. |
0.1 - 7 eV |
Chelikowsky, Cohen (1976) Phys. Rev. B14, 556 |
cryst. |
silicon |
n (T) [tab] |
2.5 - 10 |
Icenogle et al. (1976) Appl. Opt. 15, 2348. |
cryst. |
silicon |
n,k [fig] |
1 - 100 |
Barta (1977) Infr. Phys. 17, 319 |
cryst. |
silicon |
abs. (T) [fig] |
4.5 - 10 |
Bendow et al. (1977) Appl. Opt. 16, 2909. |
cryst. |
silicon |
abs.c. |
about 0.01 |
Brown et al. (1977) Phys. Rev. B15, 478 |
cryst. |
silicon |
abs.c. |
infrared |
Hordvik, Skolnik (1977) Appl. Opt. 16, 2919 |
. |
silicon |
n,k [t+f] |
0.45 - 1 |
Zanzucchi et al. (1977) J. Appl. Phys. 48, 5227 |
. |
silicon |
abs. |
infrared |
Schroder et al. (1978) IEEE Trans. Electron. Dev. ED-25, 254 |
. |
silicon |
n,k |
0.546 |
Taft (1978) J. Electrochem. Soc. 125, 968 |
hydr. |
silicon |
n (T) [fig] |
2.48 - 40 |
Freeman, Paul (1979) Phys. Rev. B 20, 716. |
cryst. |
silicon |
abs. (T) |
vis. - IR |
Weakliem, Redfield (1979) J. Appl. Phys. 50, 1491 |
cryst. |
silicon |
n,k |
0.2 - 0.83 |
Aspnes, Theeten (1980) J. Electrochem. Soc. 127, 1359 |
cryst. |
silicon |
n |
2.44 - 25 |
Edwards, Ochoa (1980) Appl. Opt. 19, 4130 |
amor. |
silicon |
abs. [fig] |
0.7 - 1.1 |
Moddel et al. (1980) Phys. Rev. B22, 1918. |
amor. |
silicon |
n,k |
0.1 - 2.5 |
Weiser et al. (1980) J. Non-Cryst. Sol. 35/36, 447 |
. |
silicon |
abs. (T) |
0.12 - 1.2 |
Sze (1981) Physics of Semiconductor Devices, J.Willey & Sons, NY |
. |
a-Si:H |
refl.,e2 |
0.12 - 1.2 |
Jan et al. (1982) Sol. Energy Mat. 8, 241 |
. |
silicon |
abs. (T) |
0.3 - 0.83 |
Jellison, Modine (1982) Appl. Phys. Lett. 41, 180 |
. |
silicon |
k (T) |
1.152 |
Jellison, Lowndes (1982) Phys. Rev. 99, 1151 |
amor. |
silicon |
n,k; e1,2 [tab] |
0.21 - 0.83 |
Aspens, Studna (1983) Phys. Rev. B 27, 985 |
amor. |
silicon |
abs. |
0.5 - 1.4 |
Evangelisti et al. (1983) J. Non-Cryst. Sol. 55, 191 |
cryst. |
silicon |
e1,2 |
107 GHz |
Kinasewitz, Senitzki (1983) J. Appl. Phys. 54, 3394 |
amor. |
silicon |
d.f.spectra [fig] |
0.21 - 0.83 |
Aspnes (1983) Phys. Rev. B 29, 768 |
cryst. |
silicon |
n,k (T) [t+f] (c!) |
0.0006 - 333 |
Edwards (1985) in Palik E. (ed) Handbook
of Optical Constants of Solids. Acad. Press., p.547. |
amor. |
silicon |
n,k [tab] (c!) |
0.01 - 148 |
Piller (1985) in Palik E. (ed) Handbook
of Optical Constants of Solids. Acad. Press., p.571. |
. |
silicon |
refr.ind.(T) |
. |
Dugas et al. (1986) Appl. Opt. 25, 3807 |
. |
silicon |
e |
0.22 - 0.73 |
Lautenschlager et al. (1987) Phys. Rev. B 36, 4821 |
. |
silicon |
e1,2 |
0.02 - inf-ty |
Adachi (1988) Phys. Rev. B 38, 12966 |
. |
silicon |
abs. |
. |
Geist et al. (1988) Appl. Opt. 27, 3777 |
. |
silicon |
opt.const. |
0.0024 - 0.1216 |
Windt et al. (1988) Appl. Opt. 27, 279 |
. |
silicon |
e1,2 |
0.02 - inf-ty |
Adachi (1989) J. Appl. Phys. 66, 3224 |
. |
silicon |
k |
0.633 |
Geist et al. (1990) J. Res. Natl. Inst. Stand. Technol. 95, 549 |
amor. |
a-Si:(H) |
diel. func. |
nearUV - nearIR |
Ilsin An et al. (1991) Appl. Phys. Lett. 59, 2543 |
amor. |
silicon |
e1,2 |
0.28 - 0.69 |
Fried et al. (1992) J. Appl. Phys. 71, 5260 |
cryst. |
silicon |
n,k |
vis. |
Jellison (1992) Opt. Mater. 1, 41 |
. |
silicon |
n,k (T) |
vis. |
Jellison et al. (1994) J. Appl. Phys. 76, 3758 |
. |
silicon |
energy depos. [fig] |
10-6 - 0.12 |
Dwek, Smith (1996) Astrophys. J. 459, 686. |
. |
silicon |
abs. |
. |
Gentile et al. (1994) Appl. Opt. 35, 4392 |
. |
silicon |
. |
50-180 eV |
Soufli, Gullikson (1997) Appl. Opt. 36, 5499 |
porous |
silicon |
. |
. |
Smyntyna, Vashpanov (1998) SPIE 3359, 553 |
. |
silicon |
n,k [f+t] (c!) |
0.207 - 0.414 |
Edwards (1998) in Palik E. (ed)
Handbook of Optical Constants of Solids, III. Acad. Press, p.531 |
. |
silicon |
n,k [f+t] (c!) |
0.4 - 1.13 |
Geist (1998) in Palik E. (ed)
Handbook of Optical Constants of Solids, III. Acad. Press, p.519 |
irrad. |
silicon |
opt.depth [fig] |
4.6 band |
Strazzulla et al. (1998) Astron. Astrophys. 338, 292. |
amor. |
silicon |
abs.coef. [fig] |
0.15 - inf-ty |
Knief, Niessen (1999) Phys. Rev. B 59, 12940 |
porous |
silicon |
refr.ind. |
. |
Lettieri et al. (1999) Opt. Commun. 168, 383 |
amor. |
silicon |
e1,2 [fig] |
0.24 - 0.8 |
Adachi, Mori (2000) Phys. Rev. B 62, 10158 |
porous |
silicon |
e1,2 [fig] |
0.06 - inf-ty |
De Filippo et al. (2001) Appl. Phys. A 73, 737 |
. |
silicon |
n,k |
very wide |
Zollner et al. (2002) Am. Phys. Soc. Meet., U12.009 |
s i l i c o n   o x i d e
(properties)
|
fused |
SiO |
n,k [fig] |
0.2 - 14 |
Hass, Salzberg (1954) J. Opt. Soc. Am. 44, 181. |
. |
SiO |
abs. |
. |
Cremer et al. (1958) Z. Electrochem. 62, 939 |
. |
SiO |
. |
. |
Ritter (1962) Opt. Acta 9, 197 |
. |
SiO |
n,k |
0.05 - 1 |
Philipp (1971) J. Phys. Chem. Sol. 32, 1935 |
. |
SiO1-2 |
abs. |
infrared |
Nakamura et al. (1984) Sol. St. Comm. 50, 1079 |
non-cryst. |
SiO |
n,k [t+f] (c!) |
0.05 - 14 |
Philipp (1985) in Palik E. (ed) Handbook
of Optical Constants of Solids. Acad. Press., p.765. |
amor. |
SiO |
transm. [fig] |
2.5 - 25 |
Morioka et al. (1998) Mon. Not. Roy. Astron. Soc. 299, 78. |
amor. |
alpha-SiOx:H |
abs.c. [fig] |
0.5 - 2.5 |
Janssen et al. (1999) Phys. Rev. B 60, 13561 |
s i l i c o n   d i o x i d e
(properties)
|
. |
quartz |
no,e (T) |
0.2 - 0.64 |
Micheli (1902) Ann. Physik 7, 772 |
cryst. |
quartz |
no,e |
0.2 - 2.5 |
Sosman (1927) Propert. Silica. NY. p.591 |
. |
quartz |
. |
. |
Laurens (1928) JOSA 17, 25 |
cryst. |
quartz |
abs. |
visual - IR |
Drummond (1935) Proc. Phys. Soc. Lond. 153, 328 |
. |
quartz |
no,e (T) |
visual |
Barbaron (1948) Compt. Rend. 226, 1443 |
. |
quartz |
no (T) |
visual |
Radhakrishnan (1948) Proc. Ind. Acad. Sci. A27, 44 |
. |
quartz |
no,e (T) |
0.25 - 0.6 |
Radhakrishnan (1951) Proc. Ind. Acad. Sci. A33, 22 |
. |
quartz |
. |
. |
Simon, McMakon (1953) J. Chem. Phys. 21, 23 |
fused |
SiO2 |
n,k [fig] |
0.2 - 14 |
Hass, Salzberg (1954) J. Opt. Soc. Am. 44, 181. |
amor. |
SiO2 |
n (T) |
0.34 - 3.5 |
Rodney, Spindler (1954) J. Res. NBS 53, 185 |
fused |
quartz glass |
refr.ind. |
UV - IR |
Rodney, Spindler (1954) J. Opt. Soc. Am. 44, 677 |
alpha |
quartz |
n,ko,e [fig] |
7 - 27 |
Spitzer, Kleinman (1961) Phys. Rev. 121, 1324. |
. |
quartz |
. |
far-IR |
Roberts, Coon (1962) J. Opt. Soc. Am. 52, 1023 |
fused |
quartz |
n,k |
0.2 - 3.7 |
Malitson (1965) J. Opt. Soc. Am. 55, 1205 |
alpha |
quartz |
n,k |
0.19 - 0.49 |
Voronkova et al. (1965) Optich. mater. dlja IK techn. Nauka, Moscow |
fused |
quartz |
n,k |
50 - 500 |
Bogens, Zukov (1966) J. Appl. Spektr. 4, 68 |
cryst. |
quartz |
n,ko |
0.05 - 0.13 |
Philipp (1966) Sol. St. Comm. 4, 73 |
fused |
quartz |
n,k |
0.05 - 0.1 |
Philipp (1966) Sol. St. Comm. 4, 73 |
fused |
silica |
n [appr] |
0.224 - 3.09 |
Buerger, Katzin (1967) J. Inorg. Nucl. Chem. 29, 2715 |
. |
quartz |
n [appr] |
0.224 - 3.09 |
Buerger, Katzin (1967) J. Inorg. Nucl. Chem. 29, 2715 |
. |
SiO2 |
abs. |
soft X-ray |
Ershov, Lukirskii (1967) Sov. Phys. Sol. St. 8, 1699 |
. |
quartz |
refl. |
. |
Perry, Wrigley (1967) Appl. Opt. 6, 586 |
. |
SiO2 |
Raman sp. |
. |
Porto, Krishnan (1967) J. Chem. Phys. 47, 1009 |
fused |
quartz |
n, abs. [fig] |
110 - 550 |
Randall, Rawcliffe (1967) Appl. Opt. 6, 1889. |
fused |
silica |
Q |
far-IR |
Bagdade, Stolen (1968) J. Phys. Chem. Sol. 29, 2001 |
cryst. |
quartz |
ne-no |
ultraviolet |
Chandrasekharan, Damany (1968) Appl. Opt. 7, 939 |
fused |
quartz |
refl. (T) [fig] |
0.06 - 0.14 |
Platzoeder, Steinmann (1968) J. Opt. Soc. Am. 58, 588. |
cryst. |
quartz |
ne-no |
ultraviolet |
Chandrasekharan, Damany (1969) Appl. Opt. 8, 671 |
glas. |
silica |
n (T) |
0.23 - 3.37 |
Wray, Neu (1969) J. Opt. Soc. Am. 59, 774 |
amor. |
SiO2 |
bands |
. |
Potapov, Rakov (1970) Opt. Spektr. 29, 751 |
amor. |
SiO2 |
n,k [tab] |
7.1 - 11.1 |
Zolotarev (1970) Opt. Spektr. 29, 66. |
fused |
silica |
n (T) [tab] |
0.23 - 3.37 |
Singh (1971) Optik 33, 293. |
glas. |
silica |
n (T) |
. |
Waxler, Cleek (1971) J. Res. Nat. Stand. A 75, 279 |
cryst. |
quartz |
n,k |
0.1 - 4 |
Amer. Inst. Phys. Handbook. (1972) McGraw Hill, NY. p.27 |
amor. |
SiO2 |
photoem. [fig] |
. |
DiStefano et al. (1972) Phys. Rev. Lett. 27, 1560 |
. |
quartz |
em. spectra (a) [fig] |
6 - 11.8 |
Hunt, Logan (1972) Appl. Opt. 11, 142. |
amor. |
quartz |
n,k [tab] |
7.1 - 50 |
Popova et al. (1972) Opt. Spektr. 33, 801. |
alpha |
quartz |
refl. |
2.5 - 50 |
Vlasov et al. (1972) IK spektry neorg.stekol. Himija, Leningrad. p.303 |
alpha |
quartz |
n,ko,e (T) [tab] |
30 - 333 |
Loewenstein et al. (1973) Appl. Opt. 12, 398. |
cryst. |
quartz |
transm., refl., e2 [fig] |
0.033 - 0.155 |
Sorokin et al. (1973) Opt. Spektr. 35, 501. |
amor. |
quartz |
m.abs.c. [t+f] |
8.9 |
Day et al. (1974) Astrophys. J. 191, 415. |
alpha |
quartz |
e |
1 MHz |
Fontella et al. (1974) J. Appl. Phys. 45, 2852 |
amor. |
quartz |
n,k |
1 - 50 |
Steyer (1974) Ph.D. thesis, Uni. Ariz. |
amor. |
quartz |
n,k [tab] |
7.14 - 25 |
Steyer et al. (1974) Appl. Opt. 13, 1586. |
cryst. |
quartz |
n (T) [fig] |
40 - 133 |
Alvarez et al. (1975) Infr. Phys. 15, 45 |
. |
quartz |
abs. |
infrared |
Galeener, Lucovski (1975) in Balkanski M. et al. (eds)
Light Scat. Solids. Flammar., p.641 |
alpha |
quartz |
n,k |
5.2 - 50 |
Gaskell, Johnson (1976) J. Non-cryst. Solids 20, 153 |
. |
silica |
refr.ind. |
. |
Presby, Kaminov (1978) Appl. Opt. 15, 3029 |
cryst. |
quartz |
n,k [tab] |
0.1 - 0.14 |
Lamy (1977) Appl. Opt. 16, 2212. |
fused |
quartz |
n,k [tab] |
0.1 - 0.165 |
Lamy (1977) Appl. Opt. 16, 2212. |
diff |
SiO2 |
abs. [fig] |
0.3 - 0.5 |
Harrington et al. (1978) Appl. Opt. 17, 1541. |
fused |
quartz |
n [fig] |
8.3 - 500 |
Parker et al. (1978) Infr. Phys. 18, 215+221 |
fused |
quartz |
n,k |
infrared |
Philipp (1978) J. Appl. Phys. 50, 1053 |
. |
silica |
refr.ind. |
. |
Presby, Kaminov (1978) Appl. Opt. 17, 3530 |
amor. |
SiO2 |
. |
soft X-ray |
Senemand, Costa Limo (1978) in Pantelides T. (ed)
Phys. SiO2 & its Interfac. Perg., p.75 |
cryst. |
SiO2 |
. |
soft X-ray |
Senemand, Costa Limo (1978) in Pantelides T. (ed)
Phys. SiO2 & its Interfac. Perg., p.75 |
amor. |
SiO2 |
k [fig] |
0.09 - 0.18 |
Weinberg et al. (1979) Phys. Rev. B19, 3107 |
. |
quartz |
. (o-ray) |
far-IR |
Cummings, Tanner (1980) J. Opt. Soc. Am. 70, 123 |
glas. |
SiO2 |
n,k [tab] |
0.007 - 0.31 |
Rife, Osantowski (1980) J. Opt. Soc. Am. 70, 1513. |
. |
quartz |
n,k (calc) |
X-rays |
Henke (1981) in Attwood D.T., Henke B.L. (eds) Low Energy
X-ray Diagn. AIP Conf. Proc., 75 |
alpha,beta |
quartz |
bands |
. |
Gorelik et al. (1982) Prepr. FIAN, 58 |
fused |
quartz |
e1,2 [fig] |
7 - 25 |
Thiebaud, Kneuluehl (1983) Infr. Phys. 23, 131 |
fused |
silica |
. |
3 - 25 |
Lang, Wolfe (1983) Appl. Opt. 22, 1267 |
fused |
silica |
. |
0.3 - 25 |
Su (1983) Appl. Opt. 22, 2949 |
. |
SiO1-2 |
abs. |
infrared |
Nakamura et al. (1984) Sol. St. Comm. 50, 1079 |
fused |
silica |
refr.ind. |
0.355 |
White, Smith (1984) Opt. Lett. 9, 10 |
alpha |
SiO2 |
n,k [tab] |
0.05 - 1000 |
Philipp (1985) in Palik E. (ed) Handbook
of Optical Constants of Solids. Acad. Press., p.719. |
glas. |
SiO2 |
n,k [tab] |
0.0006 - 500 |
Philipp (1985) in Palik E. (ed) Handbook
of Optical Constants of Solids. Acad. Press., p.749. |
fused |
silica |
Qext/a (a) [fig] |
7 - 200 |
Koike et al. (1987) Astrophys. Sp. Sci. 134, 95. |
fused |
silica |
refr.ind.(T) |
0.1849 |
Lira, Vest (1987) Appl. Opt. 26, 774 |
fused |
quartz |
n,k [tab] |
50 - 1000 |
Zhilinskii et al. (1987) Opt. Spektr. 62, 1327. |
fused |
quartz |
n,k [fig] |
7 - 300 |
Koike et al. (1989) Mon. Not. Roy. Astron. Soc. 239, 127. |
glas. |
silica |
n (T) |
. |
Jewell (1991) J. Am. Ceram. Soc. 74, 1689 |
fused |
quartz |
ext. [fig] |
7 - 400 |
Koike, Shibai (1991) in Levasseur-Regourd, Hasegawa (eds)
Origin and Evolution of Interplanetary Dust. Kluwer. p.121. |
glas. |
natural SiO2 |
ext. [fig] |
7 - 400 |
Koike, Shibai (1991) in Levasseur-Regourd, Hasegawa (eds)
Origin and Evolution of Interplanetary Dust. Kluwer. p.121. |
fused |
quartz |
Q [fig] |
2 - 400 |
Koike, Shibai (1991) Mon.Not.Roy.Astron.Soc. 269, 1011. |
glas. |
silica |
n (T) |
0.24 - 0.55 |
Matsuoka et al. (1991) J. Non-Cryst. Sol. 135, 86 |
glas. |
SiO2 |
n,k [tab] |
0.0001 - 0.024 |
Palik (1991) in Palik E. (ed) Handbook
of Optical Constants of Solids. II. Acad.Press., p.12. |
cryst. |
SiO2 |
e2,cond. [fig] |
0.06 - inf-ty |
Xu, Ching (1991) Phys. Rev. B 44, 11048 |
sput. |
SiO2 |
n,k [tab] |
0.2 - 1.2 |
Edlou et al. (1993) Appl. Opt. 32, 5601. |
fused |
silica |
n (T) |
UV - near-IR |
Ghosh (1994) IEEE Phot. Techn. Lett. 6, 431 |
glass. |
silica |
refr.ind. |
. |
Kato et al. (1995) Opt. Lett. 20, 2279 |
. |
quartz |
. |
. |
Shoji et al. (1995) JOSA 14, 2268 |
cryst. |
quartz |
n,k, emiss. [fig] |
7 - 13 |
Wald, Salisbury (1995) J. Geophys. Res. 100, 24665. |
amor. |
SiO2 |
. |
0.0014 - 0.025 |
Filatova et al. (1996) Opt. Spectr. 81, 458 |
cryst. |
quartz |
n,k [fig]; par. [tab] |
7.7 - 500 |
Wenrich, Christensen (1996) J. Geophys. Res. 101, 15921. |
amor. |
quartz |
n,k (T) [tab?] |
6.7 - 500 |
Henning, Mutschke (1997) Astron. Astrophys. 327, 743 |
cryst. |
quartz |
n,k [fig] |
5 - 24 |
Mustard, Hays (1997) Icarus 125, 145. |
. |
SiO2 |
refr.ind. |
0.38 - 0.8 |
Poenar, Wolffenbuttel (1997) Appl. Opt. 36, 5122 |
. |
silica |
. |
. |
Ghosh, Yajima (1998) J. Lightware Techn. 16, 2002 |
fused |
silica |
refr.ind. (T) |
0.19 - 0.196 |
Gupta et al. (1998) Appl. Opt. 37, 5964 |
fused |
silica |
refr.ind. (c) |
0.351,0.527,1.053 |
Milam (1998) Appl. Opt. 37, 546 |
glas. |
SiO2 |
n |
infrared |
Tan (1998) J. Non-Cryst. Sol. 223, 158 |
cryst. |
quartz |
appr. |
IR? |
Ghosh (1999) Opt. Comm. 163, 95 |
glas. |
SiO2 |
n |
infrared |
Tan (1999) Physica B 262, 98; J. Non-Cryst. Sol. 249, 51 |
. |
SiO2 |
. |
. |
Vergohl et al. (1999) Thin Sol. Films 351, 42 |
alpha |
quartz |
abs.sp. [fig] |
0.06 - 0.25 |
Chang et al. (2000) Phys. Rev. Lett. 85, 2613 |
amor. |
silica |
sp. [fig] |
7 - 100 |
Fabian et al. (2000) Astron. Astrophys. 364, 282. |
amor. |
SiO2 |
n,k |
0.77 - 1.1 |
Gunde (2000) Physica B 292, 286 |
fused |
silica |
. |
. |
Murphy, Flavin (2000) Appl. Opt. 39, 4607 |
amor. |
SiO2 |
refr.ind. |
infrared |
Ortiz et al. (2000) Thin Sol. Films 368, 74 |
ion-irrad. |
SiO2 |
refr.ind. |
. |
Swart et al. (2000) Nucl. Instr. Meth. Phys. Res. 166-7, 171 |
glas. |
SiO2 |
n (T) [fig] |
1.44 - 4.77 |
Tan, Arndt (2000) J. Phys. Chem. Solid. 61, 1315. |
fused |
silica |
. |
. |
Ekvall et al. (2001) Opt. Lett. 26, 896 |
fused |
silica |
refr. ind. |
vis. |
Hlubina (2001) Opt. Comm. 193, 1. |
glas. |
silica |
n [tab] |
1.31 - 4.84 |
Tan, Arndt (2001) J. Phys. Chem. Solid. 62, 1087. |
fused |
silica |
refr.ind. |
. |
Obata et al. (2002) Opt. Lett. 27, 330 |
. |
SiO2 |
n,k |
very wide |
Zollner et al. (2002) Am. Phys. Soc. Meet., U12.009 |